XwinSys has pioneered a hybrid approach to meet complex 3D structures in the semiconductor industry. Combining 3D optics with XRF enables a single measurement to achieve full inspection. Furthermore, the spot size of both analytical techniques is small enough to facilitate monitoring of localized features.
XRF is capable of analyzing localized 3D structures and thus has an advantage over technologies which are surface sensitive only (including XRR, XRD and optics).
Energy Dispersive X-Ray Fluorescence
EDXRF spectroscopy is the most accurate and economical analytical method for determination of the elemental composition of many types of materials.
This technique is non-destructive, requiring no sample preparation, and is suitable for almost all sample types and shapes. X-Ray Fluorescence (XRF) spectrometric analysis can be employed to measure a wide range of atomic elements, from Carbon (6) through Fermium (100), with low detection limits and high precision.
No edge exclusion- EDXRF comprises a vertical top-down beam source. Combined with the small spot size of the beam, this ensures there is no edge-exclusion zone for the tested material.
For more information about the XRF technique please visit Learn XRF